Publication:
CMOS patterning over high aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
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1914 since deposited on 2021-10-24
1last month
Acq. date: 2026-04-27
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Statistics
Views
1914 since deposited on 2021-10-24
1last month
Acq. date: 2026-04-27
Citations