Investigation of litho1-litho2 proximity differences for a LPLE double patterning process

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Authors
Wong, Patrick; De Bisschop, Peter; Robertson, Stewart; Vandenbroeck, Nadia; Biafore, John; Wiaux, Vincent; Van de Kerkhove, Jeroen
Conference
International Symposium on Lithography Extensions - EUVL
Title
Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Publication type
Proceedings paper
Embargo date
9999-12-31
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