Publication:

Investigation of litho1-litho2 proximity differences for a LPLE double patterning process

Date

2011
Proceedings Paper
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dc.contributor.authorWong, Patrick
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorRobertson, Stewart
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBiafore, John
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.accessioned2021-10-19T21:53:28Z
dc.date.available2021-10-19T21:53:28Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20157
dc.source.conferenceInternational Symposium on Lithography Extensions - EUVL
dc.source.conferencedate20/10/2011
dc.source.conferencelocationMiami (FL) USA
dc.title

Investigation of litho1-litho2 proximity differences for a LPLE double patterning process

dc.typeProceedings paper
dspace.entity.typePublication
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