Authors

Hopf, Toby; Ercken, Monique; Mannaert, Geert; Kunnen, Eddy; Tao, Zheng; Vandenbroeck, Nadia; Sebaai, Farid; Kikuchi, Yoshiaki; Mertens, Hans; Kubicek, Stefan; Demuynck, Steven; Horiguchi, Naoto

DOI

10.1117/12.2257668

Conference

Advances in Patterning Materials and Processes XXXIV

Title

CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks

Publication type

Proceedings paper

Embargo date

9999-12-31