Publication:

CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2257668
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34714.pdf 526.46 KB

Author(s)

Hopf, Toby  
;
Ercken, Monique  
;
Mannaert, Geert  
;
Kunnen, Eddy
;
Tao, Zheng  
;
Vandenbroeck, Nadia  
;
Sebaai, Farid  
;
Kikuchi, Yoshiaki  
;
Mertens, Hans  
;
Kubicek, Stefan  
;
Demuynck, Steven  
;
Horiguchi, Naoto  

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