CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks

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Author(s)

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Ercken, Monique

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Mannaert, Geert

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Vandenbroeck, Nadia

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Kikuchi, Yoshiaki

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Kubicek, Stefan

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Demuynck, Steven

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Horiguchi, Naoto

Metrics

1937 since deposited on 2021-10-24

Acq. date: 2025-10-23