Browsing by author "Vandenbroeck, Nadia"
Now showing items 21-40 of 41
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Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D.; Lucas, K.; Cobb, J.L.; Parker, C.; Patterson, K.; McCauley, R.; Ercken, Monique; Van Roey, Frieda; Vandenbroeck, Nadia; Pollentier, Ivan (2003) -
Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent; Van de Kerkhove, Jeroen; Robertson, Stewart; Biafore, John (2012) -
Litho-process-litho for 2D 32nm hp LOGIC and DRAM double patterning
Wong, Patrick; Wiaux, Vincent; Verhaegen, Staf; Vandenbroeck, Nadia (2010) -
Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Dorney, Kevin; Castellanos, Sonia; Witting Larsen, Esben; Holzmeier, Fabian; Singh, Dhirendra Pratap; Vandenbroeck, Nadia; De Simone, Danilo; De Schepper, Peter; Vaglio Pret, Alessandro; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Nuytten, Thomas; van der Heide, Paul; Petersen, John (2021) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Multiple patterning...various keys for scaling
Wiaux, Vincent; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Vandenberghe, Geert (2010) -
Multiple patterning: a path towards sub-20nm hp
Vandenberghe, Geert; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Wiaux, Vincent (2010) -
Multiple patterning: step by step towards 1X nm hp
Wiaux, Vincent; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Vandenberghe, Geert (2010) -
Probabilistic Process Window: A new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2022) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Process optimization of templated DSA flows
Gronheid, Roel; Bekaert, Joost; MKuppuswamy, Vijaya Kumar; Vandenbroeck, Nadia; Doise, Jan; Cao, Yi; Lin, Guanyang; Sayan, Safak; Parnell, Doni; Somervell, Mark (2014) -
Progress in directed self-assembly hole shrink applications
Younkin, Todd; Gronheid, Roel; Rincon Delgadillo, Paulina; Chan, BT; Vandenbroeck, Nadia; Demuynck, Steven; Romo Negreira, Ainhoa; Parnell, Doni; Nafus, Kathleen; Tahara, Shigeru; Somervell, Mark (2013) -
Staggered pillar patterning using 0.33NA EUV lithography
De Simone, Danilo; Blanc, Romuald; Van de Kerkhove, Jeroen; Tamaddon, Amir-Hossein; Fallica, Roberto; Van Look, Lieve; Rassoul, Nouredine; Lazzarino, Frederic; Vandenbroeck, Nadia; Vanelderen, Pieter; Lorusso, Gian; Van Roey, Frieda; Charley, Anne-Laure; Vandenberghe, Geert; Ronse, Kurt; Lee, Kilyoung; Lee, Junghyung; Park, Sarohan; Lim, Chang-Moon; Park, Chan-Ha (2019) -
Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Stepanenko, Nickolay; Kishimura, Shinji; Gronheid, Roel; Maenhoudt, Mireille; Ercken, Monique; Kocsis, Michael; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Benndorf, Michael (2005) -
The influence of wafer soaking and top coat processing on resist profile control in immersion lithography
Foubert, Philippe; Vandenbroeck, Nadia; Delvaux, Christie; Pollentier, Ivan; Ercken, Monique (2005) -
Thin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.
Spampinato, Valentina; Franquet, Alexis; De Simone, Danilo; Pollentier, Ivan; Vandenbroeck, Nadia; Pirkl, Alexander; Kayser, Sven; Vandervorst, Wilfried; van der Heide, Paul (2019) -
Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
Wong, Patrick; Gronheid, Roel; Wiaux, Vincent; Vaglio Pret, Alessandro; Verhaegen, Staf; Vandenbroeck, Nadia (2010) -
Toward sub-20nm pitch Fin patterning and integration with DSA
Sayan, Safak; Marzook, Taisir; Chan, BT; Vandenbroeck, Nadia; Singh, Arjun; Laidler, David; Altamirano Sanchez, Efrain; Leray, Philippe; Rincon Delgadillo, Paulina; Gronheid, Roel; Vandenberghe, Geert; Clark, William; Juncker, Aurelie (2016) -
Towards cost-effective and low defectivity DSA flows for line/space patterning
Pathangi Sriraman, Hari; Mallik, Arindam; Chan, BT; Vaid, Varun; Vandenbroeck, Nadia; Li, Jin; Hong, Sung Eun; Gronheid, Roel (2015) -
Towards electrical verification of contact holes obtained with DSA of BCP
Rincon Delgadillo, Paulina; Bekaert, Joost; Vandenbroeck, Nadia; Gronheid, Roel; Chan, BT; van der Veen, Marleen; Vandersmissen, Kevin; Boemmels, Juergen; Luong, Vinh (2015)