Toward sub-20nm pitch Fin patterning and integration with DSA

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Authors
Sayan, Safak; Marzook, Taisir; Chan, BT; Vandenbroeck, Nadia; Singh, Arjun; Laidler, David; Altamirano Sanchez, Efrain; Leray, Philippe; Rincon Delgadillo, Paulina; Gronheid, Roel; Vandenberghe, Geert; Clark, William; Juncker, Aurelie
Conference
Advances in Patterning Materials and Processes XXXIII
Title
Toward sub-20nm pitch Fin patterning and integration with DSA
Publication type
Proceedings paper
Embargo date
9999-12-31
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