Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes

Thumbnail
View/open
Metadata
Show full item record
Authors
Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent; Van de Kerkhove, Jeroen; Robertson, Stewart; Biafore, John
Conference
Optical Microlithography XXV
Title
Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections