Publication:

Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes

Date

2012
Proceedings Paper
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dc.contributor.authorWong, Patrick
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorRobertson, Stewart
dc.contributor.authorBiafore, John
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.accessioned2021-10-20T19:04:15Z
dc.date.available2021-10-20T19:04:15Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21860
dc.source.beginpage83260E
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes

dc.typeProceedings paper
dspace.entity.typePublication
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