Publication:

15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU

Date

2013
Proceedings Paper
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Author(s)

Xu, Kaidong
;
Souriau, Laurent  
;
Hellin, David  
;
Versluijs, Janko  
;
Wong, Patrick  
;
Vangoidsenhoven, Diziana  
;
Vandenbroeck, Nadia  
;
Dekkers, Harold  
;
Shi, Xiaoping
;
Albert, Johan
;
Tan, Chi Lim
;
Vertommen, Johan
;
Coenegrachts, Bart  
;
Orain, I.
;
Kimura, Y.
;
Wiaux, Vincent  
;
Boullart, Werner  

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