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15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Publication:
15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Kaidong
;
Souriau, Laurent
;
Hellin, David
;
Versluijs, Janko
;
Wong, Patrick
;
Vangoidsenhoven, Diziana
;
Vandenbroeck, Nadia
;
Dekkers, Harold
;
Shi, Xiaoping
;
Albert, Johan
;
Tan, Chi Lim
;
Vertommen, Johan
;
Coenegrachts, Bart
;
Orain, I.
;
Kimura, Y.
;
Wiaux, Vincent
;
Boullart, Werner
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2041
since deposited on 2021-10-21
Acq. date: 2025-10-22
Citations
Metrics
Views
2041
since deposited on 2021-10-21
Acq. date: 2025-10-22
Citations