Publication:

15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU

Date

2013

Proceedings Paper

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Files

27065.pdf 758.09 KB

Author(s)

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Souriau, Laurent

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Versluijs, Janko

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Vangoidsenhoven, Diziana

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Vandenbroeck, Nadia

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Dekkers, Harold

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Vertommen, Johan

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Coenegrachts, Bart

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Boullart, Werner

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Acq. date: 2026-02-27