Browsing by author "Mack, Chris A."
Now showing items 1-9 of 9
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Improvements in the measurement of local critical dimension uniformity for holes and pillars
Mack, Chris A.; Delvaux, Christie; De Simone, Danilo; Lorusso, Gian (2023) -
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022) -
Measuring and Analyzing Contact Hole Variations in EUV Lithography
Severi, Joren; Mack, Chris A.; Lorusso, Gian; De Simone, Danilo (2021) -
Probabilistic Process Window: A new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2022) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Special Section Guest Editorial: Advances in E-Beam Metrology
Lorusso, Gian; Mack, Chris A. (2023) -
Statistical simulation of resist at EUV and ArF
Biafore, John; Smith, Mark; Mack, Chris A.; Thackeray, James; Gronheid, Roel; Robertson, Stewart; Graves, Trey; Blankenship, David (2009) -
Unbiased roughness measurements from low signal-to-noise ratio scanning electron microscope images
Mack, Chris A.; Severi, Joren; Zidan, Mohamed; De Simone, Danilo; Lorusso, Gian (2023) -
Unbiased Roughness Measurements from Low Signal-to-Noise Ratio SEM Images
Mack, Chris A.; Severi, Joren; Zidan, Mohamed; De Simone, Danilo; Lorusso, Gian (2022)