Browsing by author "Lorusso, Gian"

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Clerix, Jan-Willem; Warad, L.; Hung, J.; Hody, Hubert; Van Roey, Frieda; Lorusso, Gian; Koret, R.; Lee, W. T.; Shah, K.; Delabie, Annelies (2023)

300mm in-line metrologies for the characterization of ultra-thin layer of 2D materials

Moussa, Alain; Bogdanowicz, Janusz; Groven, Benjamin; Morin, Pierre; Beggiato, Matteo; Saib, Mohamed; Santoro, G.; Abramovitz, Y.; Houchens, K.; Ben Nissim, S.; Meir, N.; Hung, J.; Urbanowicz, A.; Koret, R.; Turovets, I.; Lorusso, Gian; Charley, Anne-Laure (2023)

3D measurement of 3D NAND memory hole with CD-SEM and tilted FIB

Ohashi, Takeyoshi; Yamaguchi, Atsuko; Hasumi, Kazuhisa; Ikota, Masami; Tan, Chi Lim; Raymaekers, Tom; Van den Bosch, Geert; Furnemont, Arnaud; Lorusso, Gian (2017)

Accurate and reliable optical CD of MuGFET down to 10nm

Leray, Philippe; Lorusso, Gian; Cheng, Shaunee; Collaert, Nadine; Jurczak, Gosia; Shirke, S. (2007)

Accurate EUV lithography simulation enabled by calibrated physical resist models

Klostermann, U.K.; Mulders, T.; Schmoeller, T.; Demmerle, W.; Lorusso, Gian; Hendrickx, Eric (2010-09)

Accurate models for EUV Lithography

Hendrickx, Eric; Lorusso, Gian; Van Setten, Eelco; Hansen, Steve; Jiang, Jiong; Liu, Wei; Chen, Luogi (2009)

Accurate models for EUV lithography

Hendrickx, Eric; Lorusso, Gian; Jiang, Jiong; Chen, Luoqi; Lui, Wei; Van Setten, Eelca; Hansen, Steve (2009)

Accurate models for EUV simulation and their use for design correction

Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Hendrickx, Eric; Klostermann, Ulrich K.; Jang, Stephen; Zavyalova, Lena; Sorensen, Jacob; Gao, Weimin; Lucas, Kevin (2009)

Advanced CD-SEM imaging methodology for EPE measurements

Takemasa, Y.; Ohashi, T.; Shindo, H.; Lorusso, Gian; Charley, Anne-Laure (2018)

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

Charley, Anne-Laure; Leray, Philippe; Lorusso, Gian; Sutani, T.; Takemasa, Y. (2018)

Advanced high voltage e-beam system combined with an enhanced D2DB for on-device overlay measurement

Kang, Seulki; Maruyama, Kotaro; Yamazaki, Yuichiro; Beggiato, Matteo; Veloso, Anabela; Lorusso, Gian (2023)

Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian (2023)

Applying design-based metrology for calibrating an OPC model for FinFET pattering

Vandeweyer, Tom; Lorusso, Gian; Delvaux, Christie; De Backer, Johan; Jandhyala, Radhika; Azordegan, Amir; Abott, Gordon; Kaliblotzky, Zeev; Ercken, Monique (2005)

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007)

Better prediction on patterning failure mode with hotspot aware OPC modeling

Wei, Chih-I; Wu, Stewart; Deng, Yunfei; Khaira, Gurdaman; Kusnadi, I.; Fenger, G.; Kang, S.; Okamoto, Y.; Maruyama, K.; Yamaszaki, Y.; Das, Sayantan; Halder, Sandip; Gillijns, Werner; Lorusso, Gian (2021)

Calibration of physical resist models for simulation of extreme ultraviolet lithography

Klostermann, Ulrich K.; Muelders, Thomas; Schmoeller, Thomas; Lorusso, Gian; Hendrickx, Eric (2011)

Characterizing variation in EUV contact hole lithography

Mack, Chris; Lorusso, Gian; De Simone, Danilo; Severi, Joren (2020)

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009)

Computational nanometrology of line edge roughness: recent challenges and advances

Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017)

Computational nanometrology of line edge roughness: recent challenges and advances

Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017)