Accurate EUV lithography simulation enabled by calibrated physical resist models

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Authors

Klostermann, U.K.; Mulders, T.; Schmoeller, T.; Demmerle, W.; Lorusso, Gian; Hendrickx, Eric

ISSN

0038-111X

Journal

Solid State Technology

Title

Accurate EUV lithography simulation enabled by calibrated physical resist models

Publication type

Journal article

Embargo date

9999-12-31

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