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Accurate EUV lithography simulation enabled by calibrated physical resist models
Publication:
Accurate EUV lithography simulation enabled by calibrated physical resist models
Date
2010-09
Journal article
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21445.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Klostermann, U.K.
;
Mulders, T.
;
Schmoeller, T.
;
Demmerle, W.
;
Lorusso, Gian
;
Hendrickx, Eric
Journal
Solid State Technology
Abstract
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1914
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Citations
Metrics
Views
1914
since deposited on 2021-10-18
405
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations