Authors

Charley, Anne-Laure; Leray, Philippe; Lorusso, Gian; Sutani, T.; Takemasa, Y.

Conference

Metrology, Inspection, and Process Control for Microlithography XXXII

Title

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

Publication type

Proceedings paper

Embargo date

9999-12-31