Publication:

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

Date

2018
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorLorusso, Gian
dc.contributor.authorSutani, T.
dc.contributor.authorTakemasa, Y.
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLorusso, Gian
dc.date.accessioned2021-10-25T17:09:31Z
dc.date.available2021-10-25T17:09:31Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30392
dc.identifier.urlhttps://doi.org/10.1117/12.2298408
dc.source.beginpage1058519
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
39773.pdf
Size:
925.9 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions