Calibration of physical resist models for simulation of extreme ultraviolet lithography

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Authors

Klostermann, Ulrich K.; Muelders, Thomas; Schmoeller, Thomas; Lorusso, Gian; Hendrickx, Eric

ISSN

1537-1646

Issue

1

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Volume

10

Title

Calibration of physical resist models for simulation of extreme ultraviolet lithography

Publication type

Journal article

Embargo date

9999-12-31

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