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Calibration of physical resist models for simulation of extreme ultraviolet lithography
Publication:
Calibration of physical resist models for simulation of extreme ultraviolet lithography
Date
2011
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Klostermann, Ulrich K.
;
Muelders, Thomas
;
Schmoeller, Thomas
;
Lorusso, Gian
;
Hendrickx, Eric
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1975
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations
Metrics
Views
1975
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations