Authors

Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi

Conference

23rd European Mask and Lithography Conference - EMLC

Title

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Publication type

Proceedings paper

Embargo date

9999-12-31