Publication:

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Date

2007
Proceedings Paper
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorHermans, Jan
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-16T16:58:51Z
dc.date.available2021-10-16T16:58:51Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12369
dc.source.beginpage653313
dc.source.conference23rd European Mask and Lithography Conference - EMLC
dc.source.conferencedate23/01/2007
dc.source.conferencelocationGrenoble France
dc.title

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

dc.typeProceedings paper
dspace.entity.typePublication
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