Browsing by author "Lorusso, Gian"
Now showing items 21-40 of 140
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Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Contact inspection and resistance - capacitance measurement of Si nanowire with SEM voltage contrast
Ohashi, Takeyoshi; Hasumi, Kazuhisa; Ikota, Masami; Lorusso, Gian; Mertens, Hans; Horiguchi, Naoto (2019) -
Contact inspection of Si nanowire with SEM voltage contrast
Ohashi, Takeyoshi; Yamaguchi, Atsuko; Hasumi, Kazuhisa; Ikota, Masami; Lorusso, Gian; Horiguchi, Naoto (2018) -
Creative metrology development for EUVL: Flare and out-of-band qualification
Lorusso, Gian; Hendrickx, Eric; Davydova, N.; Peng, Y.; Eurlings, M.; Feenstra, K.; Jiang, J. (2011) -
Critical-dimension metrology for integrated circuit technology
Marchman, Herschel; Lorusso, Gian; Adel, Mike; Yedur, Sanjay (2007) -
Deep learning nanometrology of line edge roughness
Giannatou, Eva; Constantoudis, Vassilios; Papavieros, George; Papageorgiou, Harris; Rutigliani, Vito; Lorusso, Gian; Van Roey, Frieda; Gogolides, Evangelos (2019) -
Deep ultraviolet out-of-band characterization of EUVL scanners and resists
Lorusso, Gian; Matsumiya, T.; Iwashita, Jun; Hirayama, T.; Hendrickx, Eric (2013) -
Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
Lorusso, Gian; Davydova, Natalia; Eurlings, Mark; Kaya, Cemil; Peng, Yue; Feenstra, Kees; Fedynyshyn, Theodore H.; Natt, Oliver; Huber, Peter; Zaczek, Christoph; Young, Stuart; Graeupner, Paul; Hendrickx, Eric (2011) -
Dependence of EUV mask printing performance on blank architecture
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03) -
Design correction in extreme ultrviolet lithography
Fenger, Germain; Lorusso, Gian; Hendrickx, Eric; Niroomand, Ardavan (2010-10) -
Determining the ultimate resolution of scanning electron microscope unbiased roughness measurements, part 1: Simulating noise
Mack, Chris; Lorusso, Gian (2019) -
Development status of EUV resist
Hirayama, Taku; Utsumi, Yoshiyuki; Iwashita, Jun; Kawana, Daisuke; Lorusso, Gian (2013) -
Diagnosing and Removing CD-SEM Metrology Artifacts
Mack, Chris; Lorusso, Gian; Delvaux, Christie (2021) -
Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Lorusso, Gian; De Simone, Danilo; De Silva, Anuja; Haider, Ali; Verveniotis, Elisseos; Moussa, Alain; De Gendt, Stefan (2023) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
EB metrology of Ge channel gate-all-around FET: buckling evaluation and EB damage assessment
Ohashi, Takeyoshi; Hasumi, Kazuhisa; Ikota, Masami; Lorusso, Gian; Witters, Liesbeth; Horiguchi, Naoto (2020) -
Electron beam metrology for advanced technology nodes
Lorusso, Gian; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Van den Bosch, Geert; Kar, Gouri Sankar; Ohashi, Takeyoshi; Sutani, Takumichi; Watanabe, Ryota; Takemasa, Yoshikata; Ikota, Masami (2019) -
Enabling CD SEM metrology for 5nm technology node and beyond
Lorusso, Gian; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnemont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru (2017)