Dependence of EUV mask printing performance on blank architecture

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Authors
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt
Conference
Emerging Lithographic Technologies XXII
Title
Dependence of EUV mask printing performance on blank architecture
Publication type
Proceedings paper
Embargo date
9999-12-31
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