Publication:

Dependence of EUV mask printing performance on blank architecture

Date

2008-03
Proceedings Paper
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorHyun, Yoonsuk
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-17T07:54:21Z
dc.date.available2021-10-17T07:54:21Z
dc.date.embargo9999-12-31
dc.date.issued2008-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13930
dc.source.beginpage69211W
dc.source.conferenceEmerging Lithographic Technologies XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Dependence of EUV mask printing performance on blank architecture

dc.typeProceedings paper
dspace.entity.typePublication
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