Authors
Kang, Seulki;
Miura, Yuji;
Maruyama, Kotaro;
Yamazaki, Yuichiro;
Wei, Chih-, I;
Maguire, Ethan;
Fenger, Germain;
De Bisschop, Peter;
Das, Sayantan;
Halder, Sandip;
Lorusso, Gian
EISBN
978-1-5106-4982-8
ISBN
978-1-5106-4981-1
ISSN
0277-786X
Conference
Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Volume
12053
Title
E-beam metrology-based EUVL aberration monitoring
Publication type
Proceedings paper