Browsing by author "De Bisschop, Peter"
Now showing items 1-20 of 110
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A fast triple patterning solution with fix guidance
Fang, Weiping; Arikati, Srini; Celingir, Erdem; Hug, Marco A.; De Bisschop, Peter; Mailfert, Julien; Lucas, Kevin; Gao, Weimin (2014) -
A methodology for the characterization of topography induced immersion bubble defects
Kocsis, Michael; De Bisschop, Peter; Maenhoudt, Mireille; Kim, Young-Chang; Wells, Greg; List, Scott; DiBiase, Tony (2005) -
Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes
De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
Application of an inverse Mack model for negative tone development simulation
Gao, Weimin; Klostermann, Ulrich; Mülders, Thomas; Schmoeller, Thomas; Demmerle, Wolfgang; De Bisschop, Peter; Bekaert, Joost (2011) -
Binary modeling method to check the sub-resolution assist features (SRAFs) printability
Li, Jianliang; Gao, Weimin; Fan, Yongfa; Xue, Jing; Yan, Qiliang; Lucas, Kevin; De Bisschop, Peter; Melvin III, Lawrence S. (2012) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Wei, Chih-, I; Latypov, Azat; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
Calibration of Gaussian Random Field stochastic EUV models
Latypov, Azat M.; Wei, Chih-, I; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, Ulrich; Mülders, Thomas; Ponomarenco, Denis; Schmoeller, Thomas; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, U.; Mülders, T.; Ponomarenco, D.; Schmöller, T.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
Characterization of a projection lens using the extended Nijboer-Zernike approach
Dirksen, Peter; Braat, Joseph; De Bisschop, Peter; Janssen, Augustus J.E.M.; Juffermans, Casper; Williams, Alvina (2002) -
Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Bai, Kunlun; Robertson, Stewart; De Bisschop, Peter; Biafore, J. (2018) -
Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process
Fuchimoto, Daisuke; Ishimoto, Toru; Hiroyuki, Shindo; Sugahara, Hitoshi; Toyoda, Yasutaka; Mailfert, Julien; De Bisschop, Peter (2014) -
Contour-based self-aligning calibration of OPC models
Kusnadi, Ir; Do, Thuy; Granik, Yuri; Sturtevant, John L.; De Bisschop, Peter; Hibino, Daisuke (2010) -
Contour-quality assessment for OPC model calibration
Filitchkin, Paul; Do, Thuy; Kusnadi, Ir; Sturtevant, John; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Depth profiling of B through silicide on silicon structures, using secondary ion-mass spectrometry and resonant postionization mass spectrometry
De Bisschop, Peter; Gomez, J.; Geenen, Luc; Vandervorst, Wilfried (1996) -
Depth profiling of B through silicide on silicon structures, using SIMS and resonant post-ionisation SIMS
De Bisschop, Peter; Gomez, G.; Geenen, Luc; Vandervorst, Wilfried (1995) -
Design compliance for Spacer Is Dielectric (SID) patterning
Luk-Pat, Gerard; Miloslavsky, Alex; Painter, Ben; Lin, Li; De Bisschop, Peter; Lucas, Kevin (2012) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
Effective use of aerial image metrology for calibration of OPC models
Chen, Ao; Foong, Yee Mei; Thaler, Thomas; Buttgereit, Ute; Chung, Angeline; Burbine, Andrew; Sturtevant, John; Clifford, Chris; Adam, Kostas; De Bisschop, Peter (2017)