Browsing by author "De Bisschop, Peter"
Now showing items 21-40 of 110
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Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers
Lariviere, Stephane; Wilson, Chris; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Beral, Christophe; Van Den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryan Ryoung han; McIntyre, Greg; Ronse, Kurt; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2018) -
Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
De Bisschop, Peter; Hansen, Steven G. (2022) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV photoresist patterning characterization for imec N7/N5 technology
De Simone, Danilo; Rutigliani, Vito; Lorusso, Gian; De Bisschop, Peter; Vesters, Yannick; Blanco, Victor; Vandenberghe, Geert (2018) -
EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems
Sah, Kaushik; Cross, Andrew; Plihal, Martin; Anantha, Vidyasagar; Babulnath, Raghav; Fung, Derek; De Bisschop, Peter; Halder, Sandip (2018) -
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A..; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
EUV vote-taking lithography: Crazy.... or not ?
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A.; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
Evaluation of stray light and quantitative analysis of its impact on lithography
Kim, Young-Chang; De Bisschop, Peter; Vandenberghe, Geert (2005) -
Experimental proximity matching of ArF scanners
Bekaert, Joost; Van Look, Lieve; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, K.; Menger, J.; Schiffelers, G.; Knols, E.; van der Laan, H.; Willekers, R. (2008) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Hard pellicle investigation for 157 nm lithography: impact on overlay
Bruls, R.; Uitterdijk, T.; Cicilia, O.; De Bisschop, Peter; Kocsis, Michael; Grenville, A.; Van Peski, C.; Engelstad, R.; Chang, J.; Cotte, E.; Okada, K.; Ohta, K.; Mishiro, H.; Kikugawa, S. (2004) -
Hard pellicle investigation for 157nm lithography : impact on overlay
Bruls, R. J.; Uitterdijk, T.; Cicilia, O.; De Bisschop, Peter (2003) -
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2011-02) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
How to make lithography patterns print: the role of OPC and pattern layout
De Bisschop, Peter (2015) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns
Foubert, Philippe; De Bisschop, Peter; Bekaert, Joost; Beral, Christophe; Rincon Delgadillo, Paulina (2019) -
Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Philipsen, Vicky; Mesuda, Kei; De Bisschop, Peter; Erdmann, Andreas; Citarella, Giuseppe; Evanschitzky, Peter; Birkner, Robert; Richter, Rigo; Scherübl, Thomas (2007)