Browsing by author "De Bisschop, Peter"
Now showing items 41-60 of 110
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Impact of finite laser bandwidth on the critical dimension of L/S structures
De Bisschop, Peter; Lalovic, Ivan; Trintchouk, Fedor (2008) -
Impact of high order aberrations on the performance of the aberration monitor
Dirksen, P.; Juffermans, C.; Engelen, A.; De Bisschop, Peter; Muellerke, H. (2000) -
Impact of illumination source symmetrization in OPC
Sturtevant, John L.; Hong, Le; Jayaram, Srividya; Renwick, Stephen P.; McCallum, Martin; De Bisschop, Peter (2008) -
Impact of mask three dimensional effects on resist-model calibration
De Bisschop, Peter; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Biafore, John; Robertson, Stewart A.; Smith, Mark (2009) -
Impact of stochastic effects on EUV printability limits
De Bisschop, Peter; Van de Kerkhove, Jeroen; Mailfert, Julien; Vaglio Pret, Alessandro; Biafore, John (2014) -
Increasing the predictability of AIMS measurements by coupling to resist simulations
Meliorisz, Balint; Erdmann, Andreas; Schnattinger, Thomas; Strössner, Ulrich; Scherübl, Thomas; De Bisschop, Peter; Philipsen, Vicky (2008) -
Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Van Peski, C.; Grenville, A. (2004) -
Initial assessment of the impact of the use of a hard pellicle on imaging
De Bisschop, Peter; Bruls, Richard; Cicilia, Orlando; Uitterdijk, Tammo; Grenville, Andrew; Kocsis, Michael; Van Peski, Chris (2003) -
Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
Kocsis, Michael; De Bisschop, Peter; Bruls, R.; Grenville, A.; Van Peski, C. (2004) -
Initial assessment of the lithographic impact of the use of hard pellicles : an overview
De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Grenville, A.; Van Peski, C. (2004) -
Inspection and metrology challenges for 3 nm node devices and beyond
Shohjoh, T.; Ikota, M.; Isawa, M.; Lorusso, Gian; Horiguchi, Naoto; Briggs, Basoene; Mertens, Hans; Bogdanowicz, Janusz; De Bisschop, Peter; Charley, Anne-Laure (2021) -
Interactions between imaging layers during LPLE double patterning lithography
Robertson, Stewart; Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent (2012) -
Introducing 157nm full field lithography
Goethals, Mieke; De Bisschop, Peter; Hermans, Jan (2003) -
Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Wong, Patrick; De Bisschop, Peter; Robertson, Stewart; Vandenbroeck, Nadia; Biafore, John; Wiaux, Vincent; Van de Kerkhove, Jeroen (2011) -
Joint optimization of layout and litho for SRAM and Logic towards the 20 nm node, using 193i
De Bisschop, Peter; Laenens, Bart; Iwase, Kazuya; Yao, Teruyoshi; Dusa, Mircea; Smayling, M. (2011) -
Joint-optimization for SRAM and Logic for 28nm node and below
Verhaegen, Staf; Smayling, Michael C.; De Bisschop, Peter; Laenens, Bart (2010) -
Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent; Van de Kerkhove, Jeroen; Robertson, Stewart; Biafore, John (2012) -
Mask and wafer topography effects in immersion lithography
Erdmann, Andreas; Evanschitzky, Peter; De Bisschop, Peter (2005) -
Mask transmission resonance in bi-layer masks
Philipsen, Vicky; De Bisschop, Peter; Mesuda, Kei (2008) -
Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology
Kondo, Tsuyoshi; Ban, N.; Ebizuka, Y.; Toyoda, Y.; Yamada, Y.; Kashiwa, T.; Koike, H.; Shindo, H.; Charley, Anne-Laure; Saib, Mohamed; Van Roey, Frieda; De Bisschop, Peter; De Simone, Danilo; Beral, Christophe; Lorusso, Gian (2021)