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Conference contributions
Mask and wafer topography effects in immersion lithography
Publication:
Mask and wafer topography effects in immersion lithography
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Date
2005
Proceedings Paper
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12725.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Erdmann, Andreas
;
Evanschitzky, Peter
;
De Bisschop, Peter
Journal
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1982
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations
Metrics
Views
1982
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations