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Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
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Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
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Date
2004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Bisschop, Peter
;
Kocsis, Michael
;
Bruls, R.
;
Van Peski, C.
;
Grenville, A.
Journal
Journal of Microlithography, Microfabrication and Microsystems
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1954
since deposited on 2021-10-15
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last month
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last week
Acq. date: 2025-12-10
Citations
Metrics
Views
1954
since deposited on 2021-10-15
3
last month
1
last week
Acq. date: 2025-12-10
Citations