Authors

De Bisschop, Peter; Laenens, Bart; Iwase, Kazuya; Yao, Teruyoshi; Dusa, Mircea; Smayling, M.

Conference

Optical Microlithography XXIV

Title

Joint optimization of layout and litho for SRAM and Logic towards the 20 nm node, using 193i

Publication type

Proceedings paper

Embargo date

9999-12-31