Experimental validation of rigorous, 3D profile models for negative-tone develop resists

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Authors
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien
Conference
Optical Microlithography XXVIII
Title
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Publication type
Proceedings paper
Embargo date
9999-12-31
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