Authors

Bruls, R.; Uitterdijk, T.; Cicilia, O.; De Bisschop, Peter; Kocsis, Michael; Grenville, A.; Van Peski, C.; Engelstad, R.; Chang, J.; Cotte, E.; Okada, K.; Ohta, K.; Mishiro, H.; Kikugawa, S.

Conference

20th European Mask Conference on Mask Technology for Integrated Circuits and Microcomponents

Title

Hard pellicle investigation for 157 nm lithography: impact on overlay

Publication type

Proceedings paper