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Hard pellicle investigation for 157 nm lithography: impact on overlay
Publication:
Hard pellicle investigation for 157 nm lithography: impact on overlay
Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bruls, R.
;
Uitterdijk, T.
;
Cicilia, O.
;
De Bisschop, Peter
;
Kocsis, Michael
;
Grenville, A.
;
Van Peski, C.
;
Engelstad, R.
;
Chang, J.
;
Cotte, E.
;
Okada, K.
;
Ohta, K.
;
Mishiro, H.
;
Kikugawa, S.
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1935
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1935
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations