Publication:
Hard pellicle investigation for 157 nm lithography: impact on overlay
Date
| dc.contributor.author | Bruls, R. | |
| dc.contributor.author | Uitterdijk, T. | |
| dc.contributor.author | Cicilia, O. | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Kocsis, Michael | |
| dc.contributor.author | Grenville, A. | |
| dc.contributor.author | Van Peski, C. | |
| dc.contributor.author | Engelstad, R. | |
| dc.contributor.author | Chang, J. | |
| dc.contributor.author | Cotte, E. | |
| dc.contributor.author | Okada, K. | |
| dc.contributor.author | Ohta, K. | |
| dc.contributor.author | Mishiro, H. | |
| dc.contributor.author | Kikugawa, S. | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Kocsis, Michael | |
| dc.date.accessioned | 2021-10-15T12:48:20Z | |
| dc.date.available | 2021-10-15T12:48:20Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8643 | |
| dc.source.beginpage | 1 | |
| dc.source.conference | 20th European Mask Conference on Mask Technology for Integrated Circuits and Microcomponents | |
| dc.source.conferencedate | 12/01/2004 | |
| dc.source.conferencelocation | Dresden Germany | |
| dc.source.endpage | 11 | |
| dc.title | Hard pellicle investigation for 157 nm lithography: impact on overlay | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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