Contour-based self-aligning calibration of OPC models

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Authors
Kusnadi, Ir; Do, Thuy; Granik, Yuri; Sturtevant, John L.; De Bisschop, Peter; Hibino, Daisuke
Conference
Metrology, Inspection and Process Control for Microlithography XXIV
Title
Contour-based self-aligning calibration of OPC models
Publication type
Proceedings paper
Embargo date
9999-12-31
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