Effective use of aerial image metrology for calibration of OPC models

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Authors
Chen, Ao; Foong, Yee Mei; Thaler, Thomas; Buttgereit, Ute; Chung, Angeline; Burbine, Andrew; Sturtevant, John; Clifford, Chris; Adam, Kostas; De Bisschop, Peter
DOI
10.1117/12.2258632
Conference
Optical Microlithography XXX
Title
Effective use of aerial image metrology for calibration of OPC models
Publication type
Proceedings paper
Embargo date
9999-12-31
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