Publication:

Effective use of aerial image metrology for calibration of OPC models

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2258632
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dc.contributor.authorChen, Ao
dc.contributor.authorFoong, Yee Mei
dc.contributor.authorThaler, Thomas
dc.contributor.authorButtgereit, Ute
dc.contributor.authorChung, Angeline
dc.contributor.authorBurbine, Andrew
dc.contributor.authorSturtevant, John
dc.contributor.authorClifford, Chris
dc.contributor.authorAdam, Kostas
dc.contributor.authorDe Bisschop, Peter
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.accessioned2021-10-24T03:23:55Z
dc.date.available2021-10-24T03:23:55Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.doi10.1117/12.2258632
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28006
dc.source.beginpage101470Y
dc.source.conferenceOptical Microlithography XXX
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Effective use of aerial image metrology for calibration of OPC models

dc.typeProceedings paper
dspace.entity.typePublication
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