Comparative stochastic process variation bands for N7, N5, and N3 at EUV

Thumbnail
Metadata
Show full item record
Authors
Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Bai, Kunlun; Robertson, Stewart; De Bisschop, Peter; Biafore, J.
Conference
Extreme Ultraviolet (EUV) Lithography IX
Title
Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Publication type
Proceedings paper
Collections