Browsing by author "Fenger, Germain"
Now showing items 1-20 of 31
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Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian (2023) -
Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Fenger, Germain; Burbine, Andrew; Torres, J. Andres; Ma, Yuansheng; Granik, Yuri; Krasnova, Polina; Vandenberghe, Geert; Gronheid, Roel; Bekaert, Joost (2014) -
Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Wei, Chih-, I; Latypov, Azat; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
Calibration of Gaussian Random Field stochastic EUV models
Latypov, Azat M.; Wei, Chih-, I; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
Density limits in logic metal1 using double patterning
Wiaux, Vincent; Verhaegen, Staf; Fenger, Germain; Wong, Patrick (2009) -
Design correction in extreme ultrviolet lithography
Fenger, Germain; Lorusso, Gian; Hendrickx, Eric; Niroomand, Ardavan (2010-10) -
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
Experimental determination and accurate modeling of the EUV ADT flare
Hendrickx, Eric; Lorusso, Gian; Fenger, Germain; Lam, Michael; Word, James (2009) -
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Sejpal, Rajiv; Philipsen, Vicky; Armeanu, Ana; Wei, Chi-I; Gillijns, Werner; Lafferty, Neal; Fenger, Germain; Hendrickx, Eric (2019) -
Feasibility of compensating for EUV field edge effects through OPC
Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce (2014) -
Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Lorusso, Gian; Van Roey, Frieda; Hendrickx, Eric; Fenger, Germain; Lam, Michael; Christian, Zuniga; Habib, Mohamed; Diab, Hesham; Word, James (2009) -
Full chip correction of EUV design
Lorusso, Gian; Hendrickx, Eric; Fenger, Germain; Niroomand, Ardavan (2010) -
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2011-02) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Implementation of templated DSA for via layer patterning at the 7 nm node
Gronheid, Roel; Doise, Jan; Bekaert, Joost; Chan, BT; Karageorgos, Ioannis; Ryckaert, Julien; Vandenberghe, Geert; Cao, Yi; Lin, G.; Somervell, Mark; Fenger, Germain; Fuchimoto, Daisuke (2015)