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Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
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Authors
Sejpal, Rajiv
;
Philipsen, Vicky
;
Armeanu, Ana
;
Wei, Chi-I
;
Gillijns, Werner
;
Lafferty, Neal
;
Fenger, Germain
;
Hendrickx, Eric
Conference
Photomask Technology 2019
Title
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Publication type
Proceedings paper
Embargo date
9999-12-31
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