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Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
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Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
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Date
2019
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sejpal, Rajiv
;
Philipsen, Vicky
;
Armeanu, Ana
;
Wei, Chi-I
;
Gillijns, Werner
;
Lafferty, Neal
;
Fenger, Germain
;
Hendrickx, Eric
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1954
since deposited on 2021-10-27
Acq. date: 2025-12-11
Citations
Metrics
Views
1954
since deposited on 2021-10-27
Acq. date: 2025-12-11
Citations