Feasibility of compensating for EUV field edge effects through OPC

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Authors
Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce
Conference
Extreme Ultraviolet (EUV) Lithography V
Title
Feasibility of compensating for EUV field edge effects through OPC
Publication type
Proceedings paper
Embargo date
9999-12-31
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