Publication:

Feasibility of compensating for EUV field edge effects through OPC

Date

2014
Proceedings Paper
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dc.contributor.authorMaloney, Chris
dc.contributor.authorWord, James
dc.contributor.authorFenger, Germain
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorLorusso, Gian
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHendrickx, Eric
dc.contributor.authorSmith, Bruce
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-22T03:26:00Z
dc.date.available2021-10-22T03:26:00Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24193
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1863985
dc.source.beginpage90480T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Feasibility of compensating for EUV field edge effects through OPC

dc.typeProceedings paper
dspace.entity.typePublication
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