Browsing by author "Wei, Chih-, I"
Now showing items 1-6 of 6
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Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian (2023) -
Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Wei, Chih-, I; Latypov, Azat; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
Calibration of Gaussian Random Field stochastic EUV models
Latypov, Azat M.; Wei, Chih-, I; De Bisschop, Peter; Khaira, Gurdaman; Fenger, Germain (2022) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Fallica, Roberto; Lee, Jeonghoon; Kim, Ryan Ryoung han; Halder, Sandip; Maguire, Ethan; Armeanu, Ana-Maria; Sears, Monica; Lafferty, Neal; Liubich, Vlad; Wei, Chih-, I; Fenger, Germain (2022)