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Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
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Authors
Sah, Kaushik
;
Cross, Andrew
;
Das, Sayantan
;
Fallica, Roberto
;
Lee, Jeonghoon
;
Kim, Ryan Ryoung han
;
Halder, Sandip
;
Maguire, Ethan
;
Armeanu, Ana-Maria
;
Sears, Monica
;
Lafferty, Neal
;
Liubich, Vlad
;
Wei, Chih-, I
;
Fenger, Germain
DOI
10.1117/12.2645953
EISBN
978-1-5106-5640-6
ISSN
0277-786X
Conference
International Conference on Extreme Ultraviolet Lithography
Journal
Proceedings of SPIE
Volume
12292
Title
Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
Publication type
Proceedings paper
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Conference contributions
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Version
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Date
Summary
2
20.500.12860/41334.2
*
2023-06-08T13:50:00Z
validation by library/open access desk
1
20.500.12860/41334
2023-03-22T03:41:01Z
*Selected version
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