Publication:

Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2645953
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Author(s)

Sah, Kaushik
;
Cross, Andrew
;
Das, Sayantan  
;
Fallica, Roberto  
;
Lee, Jeonghoon  
;
Kim, Ryan Ryoung han
;
Halder, Sandip  
;
Maguire, Ethan
;
Armeanu, Ana-Maria
;
Sears, Monica
;
Lafferty, Neal
;
Liubich, Vlad
;
Wei, Chih-, I
;
Fenger, Germain

Journal

Proceedings of SPIE

Abstract

Description

Statistics

Views

1430 since deposited on 2023-03-22
1last month
Acq. date: 2026-04-05

Citations

Statistics

Views

1430 since deposited on 2023-03-22
1last month
Acq. date: 2026-04-05

Citations