Publication:

Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2645953
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Author(s)

Sah, Kaushik
;
Cross, Andrew
;
Das, Sayantan  
;
Fallica, Roberto  
;
Lee, Jeonghoon  
;
Kim, Ryan Ryoung han
;
Halder, Sandip  
;
Maguire, Ethan
;
Armeanu, Ana-Maria
;
Sears, Monica
;
Lafferty, Neal
;
Liubich, Vlad
;
Wei, Chih-, I
;
Fenger, Germain

Journal

Proceedings of SPIE

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1422 since deposited on 2023-03-22
Acq. date: 2025-10-25

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1422 since deposited on 2023-03-22
Acq. date: 2025-10-25

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