Browsing by author "Lafferty, Neal"
Now showing items 1-8 of 8
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Complementary dipole exposure solutions at 0.29k1
Hendrickx, Eric; Torres, Andres; Lafferty, Neal; Le Cam, Laurent; Johnson, Stephen; Reita, Carlo; Vandenberghe, Geert; Maurer, Wilhelm (2005) -
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Sejpal, Rajiv; Philipsen, Vicky; Armeanu, Ana; Wei, Chi-I; Gillijns, Werner; Lafferty, Neal; Fenger, Germain; Hendrickx, Eric (2019) -
Gray assist bar OPC
Lafferty, Neal; Vandenberghe, Geert; Smith, B.W.; Lassiter, Matthew; Martin, Patrick M. (2004-10) -
Physically-based compact models for fast lithography simulation
Lafferty, Neal; Adam, Kostas; Granik, Yuri; Torres, Andres; Maurer, Wilhelm (2005) -
Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Fallica, Roberto; Lee, Jeonghoon; Kim, Ryan Ryoung han; Halder, Sandip; Maguire, Ethan; Armeanu, Ana-Maria; Sears, Monica; Lafferty, Neal; Liubich, Vlad; Wei, Chih-, I; Fenger, Germain (2022)