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Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

dc.contributor.authorSah, Kaushik
dc.contributor.authorCross, Andrew
dc.contributor.authorDas, Sayantan
dc.contributor.authorFallica, Roberto
dc.contributor.authorLee, Jeonghoon
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorHalder, Sandip
dc.contributor.authorMaguire, Ethan
dc.contributor.authorArmeanu, Ana-Maria
dc.contributor.authorSears, Monica
dc.contributor.authorLafferty, Neal
dc.contributor.authorLiubich, Vlad
dc.contributor.authorWei, Chih-, I
dc.contributor.authorFenger, Germain
dc.date.accessioned2023-06-08T13:51:06Z
dc.date.available2023-03-22T03:41:01Z
dc.date.available2023-06-08T13:51:06Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000944102600031
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41334.2
dc.sourceWOS
dc.titleSingle Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorLee, Jeonghoon
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.identifier.doi10.1117/12.2645953
dc.identifier.eisbn978-1-5106-5640-6
dc.source.numberofpages3
dc.source.peerreviewyes
dc.source.beginpageArt. 122920W
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12292
imec.availabilityPublished - imec


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220.500.12860/41334.2*2023-06-08T13:50:00Zvalidation by library/open access desk
120.500.12860/413342023-03-22T03:41:01Z

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